Plasma double layer development during high power EUV exposure

The development of electrostatic plasma double layer (DL) at the boundary of Extreme Ultra Violet (EUV) exposed and un-exposed region in the bulk volume has been confirmed by 3DPIC (Particle-In-Cell) simulations in the context of fast transient high power EUV exposures.

It is found that the DL exists only for short time scale during EUV-ON time period (~ 70ns) and disappears soon after EUV is OFF.

Such DL fingerprint appears above a certain critical value of EUV beam energy (~ 0.1mJ) and it transforms from weak-to-strong DL with further increase of EUV power.